Fluorescent photoimaging with polymers having protected quinizarin dye precursors by a dry process based on chemical amplification

Reactive and Functional Polymers

Volumn 69, Issue 2, 2009, Pages 111-116

  Ahn, Kwang Duk ^a   Yoo, Kyoung Wook ^a   Soh, Jin Ho ^a   Kang, Jong Hee ^a  

^a Korea Institute of Science and Technology   (South Korea)

Author keywords

Deprotection by acidolysis; Fluorescent imaging; Lithography; Photogenerated acid; Quinizarin polymers

Indexed keywords

ACIDS; AMPLIFICATION; FLUORESCENCE; LITHOGRAPHY; PHOTORESISTS; PLASTIC FILMS; POLYMERS; SPECTRUM ANALYZERS; STYRENE; THICKNESS MEASUREMENT;

ACIDOLYTIC DEPROTECTION; CHEMICAL AMPLIFICATIONS; DEPROTECTION BY ACIDOLYSIS; DRY LITHOGRAPHIES; DRY PROCESS; FLUORESCENT IMAGING; HIGH RESOLUTIONS; HIGH YIELDS; PHOTO ACID GENERATORS; PHOTO-IMAGING; PHOTO-INDUCED; PHOTOGENERATED ACID; PRECURSOR POLYMERS; QUINIZARIN POLYMERS; SPECTRAL ANALYSIS; SPIN-CAST FILMS; STYRENE MONOMERS;

POLYMER FILMS;

EID: 59649096948     PISSN: 13815148     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.reactfunctpolym.2008.10.012     Document Type: Article

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