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Macromolecular Chemistry and Physics

Volumn 204, Issue 16, 2003, Pages 1989-1993

Chemically Amplified Photolithography of a Copolymer Containing Phenolphthalein

(4) Lee, Chan Woo a Yuan, Zhongzhe a Kim, Young Bum a Lee, Suck Hyun a

a Ajou University (South Korea)

Author keywords

Imaging; Lithography; Ph sensitive; Phenolphthalein; Thin films

Indexed keywords

COPOLYMERIZATION; COPOLYMERS; DISSOLUTION; PH; PHOTOLITHOGRAPHY; SOLUBILITY;

COLORIMETRIC TRANSITIONS; MICRO-PATTERNING;

PHENOLIC RESINS;

COPOLYMER; DIOXANE; METHACRYLIC ACID METHYL ESTER; PHENOLPHTHALEIN; PHENOLPHTHALEIN METHACRYLATE; UNCLASSIFIED DRUG;

ALKALINITY; ANALYTIC METHOD; ARTICLE; CHEMICAL ANALYSIS; CHEMICAL STRUCTURE; CHEMICALLY AMPLIFIED PHOTOLITHOGRAPHY; COLORIMETRY; DISSOLUTION; FILM; GENETIC PROCEDURES; OPTICS; PH; REPRODUCIBILITY; SOLUBILITY; STRUCTURE ANALYSIS;

EID: 0242680408 PISSN: 10221352 EISSN: None Source Type: Journal
DOI: 10.1002/macp.200350053 Document Type: Article

Times cited : (8)

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