A novel photoresist based on polymeric acid amplifiers

Chemistry Letters

Volumn , Issue 9, 2000, Pages 1036-1037

  Park, Sang Wook ^a   Arimitsu, Koji ^a   Lee, Sungeun ^a   Ichimura, Kunihiro ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0034339980     PISSN: 03667022     EISSN: None     Source Type: Journal    
DOI: 10.1246/cl.2000.1036     Document Type: Article

References (19)

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17. 4: C, 64.29; H, 7.14; S, 9.52%.
18. -1 and 5.9, respectively. The Tg was 112 °C.
19. -1 and 5.4, respectively. The Tg was 108 °C.