High-resolution X-ray diffractometry and X-ray reflectometry techniques for structural studies of complicated thin-layered heterostructures: Complementarity between Fourier Transform-based procedures and simulation softwares

Journal De Physique. IV : JP

Volumn 118, Issue , 2004, Pages 203-211

  Durand, O ^a   De Rossi, A ^a   Bouchier, A ^a  

^a THALES RESEARCH AND TECHNOLOGY   (France)

Author keywords

Fourier transform; High resolution x ray diffractometry; Interfacial segregation profiles; Semi conductor heterostructures; Thickness determination; X ray reflectometry

Indexed keywords

CRYSTALS; DIFFRACTION; DIFFRACTOMETERS; REFLECTION; REFLECTOMETERS; SEGREGATION (METALLOGRAPHY); SEMICONDUCTING SILICON COMPOUNDS; SOFTWARE RELIABILITY; STRAIN MEASUREMENT; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS; X RAYS;

HIGH-RESOLUTION X-RAY DIFFRACTOMETRY; INTERFACIAL SEGREGATION PROFILES; SEMI-CONDUCTOR HETEROSTRUCTURES; THICKNESS DETERMINATION; X-RAY REFLECTOMETRY;

FOURIER TRANSFORMS;

EID: 59249090552     PISSN: 11554339     EISSN: 17647177     Source Type: Conference Proceeding    
DOI: 10.1051/jp4:2004118024     Document Type: Article

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