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Applied Physics Letters

Volumn 94, Issue 3, 2009, Pages

Influence of a transient hexagonal phase on the microstructure and morphological stability of NiSi films

(6) Van Bockstael, C a De Keyser, K a Van Meirhaeghe, R L a Detavernier, C a Jordan Sweet, J L b Lavoie, C b

a GHENT UNIVERSITY (Belgium)

b IBM T J WATSON RESEARCH CENTER (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AGGLOMERATION; BACKSCATTERING; DIFFRACTION; MICROSTRUCTURE; NICKEL; NICKEL ALLOYS; NICKEL COMPOUNDS; SCANNING ELECTRON MICROSCOPY; SILICIDES;

ELECTRON BACK-SCATTERING DIFFRACTIONS; HEXAGONAL PHASE; IN-SITU; LARGE GRAINS; MORPHOLOGICAL STABILITIES; NI FILMS; NICKEL SILICIDES; NISI FILMS; POLE FIGURES; RESISTANCE MEASUREMENTS; SCANNING ELECTRON MICROSCOPY IMAGES;

PHASE STABILITY;

EID: 58849160568 PISSN: 00036951 EISSN: None Source Type: Journal
DOI: 10.1063/1.3073750 Document Type: Article

Times cited : (39)

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