High-temperature degradation of NiSi films: Agglomeration versus NiSi 2 nucleation

Journal of Applied Physics

Volumn 98, Issue 3, 2005, Pages

  Deduytsche, D ^a   Detavernier, C ^a   Van Meirhaeghe, R L ^a   Lavoie, C ^b  

^a GHENT UNIVERSITY   (Belgium)

^b IBM T J WATSON RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

HIGH-TEMPERATURE DEGRADATION; METAL DEPOSITION; MORPHOLOGICAL STABILITY; SHEET RESISTANCE;

AGGLOMERATION; ANNEALING; DEGRADATION; DEPOSITION; HIGH TEMPERATURE OPERATIONS; LIGHT SCATTERING; MORPHOLOGY; NICKEL COMPOUNDS; POLYCRYSTALLINE MATERIALS; SILICON ON INSULATOR TECHNOLOGY; THERMODYNAMIC PROPERTIES; THERMODYNAMIC STABILITY;

THIN FILMS;

EID: 24044493967     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2005380     Document Type: Article

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