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Volumn 603, Issue 3, 2009, Pages 503-506

Influence of the substrate hydrophilicity on the grid assisted deposition of tris-(8-hydroxyquinolinato) aluminum(III) thin films

Author keywords

Grid assisted deposition; Self organization; Unconventional lithography

Indexed keywords

ALUMINA; WETTING;

EID: 58749085014     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.susc.2008.12.012     Document Type: Article
Times cited : (7)

References (37)
  • 37
    • 58749103697 scopus 로고    scopus 로고
    • note
    • The solvent rate evaporation was tested changing the substrate temperature from 20 to 30 °C.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.