Pentacene self-aggregation at the Au(110)-(1×2) surface: Growth morphology and interface electronic states

Thin Solid Films

Volumn 428, Issue 1-2, 2003, Pages 227-231

  Menozzi, Claudia ^a   Corradini, Valdis ^a,d   Cavallini, Massimiliano ^b   Biscarini, Fabio ^b   Betti, Maria Grazia ^c   Mariani, Carlo ^c,d  

^a UNIVERSITY OF MODENA AND REGGIO EMILIA   (Italy)

^b CNR   (Italy)

^c UNIVERSITÀ DI ROMA LA SAPIENZA   (Italy)

^d INFM   (Italy)

Author keywords

Atomic force microscopy; Growth; Interface states; Low energy electron diffraction (LEED); Self assembly; Surface structure, morphology, roughness and topography; Ultraviolet photoelectron spectroscopy

Indexed keywords

AGGLOMERATION; ATOMIC FORCE MICROSCOPY; DIFFUSION; ELECTRONIC PROPERTIES; GOLD; GROWTH (MATERIALS); LOW ENERGY ELECTRON DIFFRACTION; PHOTOELECTRON SPECTROSCOPY; SELF ASSEMBLY; SUBSTRATES; SURFACE ROUGHNESS; SURFACE STRUCTURE; THERMAL EFFECTS; THIN FILMS;

TOPOGRAPHY;

OLIGOMERS;

EID: 0037457158     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(02)01269-5     Document Type: Conference Paper

References (19)

1. Schon J.H., Berg S., Kloc Ch., Batlogg B. Science. 287:2000;1022.
2. Schon J.H., Batlogg B. J. Appl. Phys. 89:2001;336.
3. Vargas M.C., Giannozzi P., Selloni A., Scoles G. J. Phys. Chem. B. 105:2001;9509.
4. Umbach E., Seidel C., Taborski J., Li R., Soukopp A. Phys. Stat. Sol. 192:1995;389.
5. Lukas S., Witte G., Wöll Ch. Phys. Rev. Lett. 88:2002;28301.
6. Schroeder P.G., France C.B., Park J.B., Parkinson B.A. J. Appl. Phys. 91:2002;3010.
7. Kymissis I., Dimitrakopoulos C.D., Purushothaman S. IEEE Trans. Elec. Dev. 44:2001;1060.
8. Dimitrakopoulos C.D., Mascaro D.J. IBM J. Res. Dev. 45:2001;11.
9. Lin Y.Y., Gundlach D.J., Nelson S.F., Jackson T.N. IEEE Elec. Dev. Lett. 18:1997;606.
10. Hamers R.J. Nature. 412:2001;489.
11. Meyer zu Heringdorf F.J., Renter M.C., Trump R.M. Nature. 412:2001;517.
12. Jentzsch T., Juepner H.J., Brzezinka K.-W., Lau A. Thin Solid Films. 315:1998;273.
13. Bouchoms I.P.M., Schoonveld W.A., Vrijmoeth J., Klapwijk T.M. Synth. Met. 104:1999;175.
14. Knipp D., Street R.A., Krusor B., Apte R., Ho J. J. Non-Cryst. Solids. 299-302:2002;1042.
15. Lin Y.Y., Gundlach D.J., Nelson S.F., Jackson T.N. IEEE Trans. Elec. Dev. 44:1997;1325.
16. Dimitrakopoulos C.D., Brown A.R., Pomp A. J. Appl. Phys. 80:1996;2501.
17. Chen X.L., Lovinger A.J., Bao Z., Sapjeta J. Chem. Mater. 13:2001;1341.
18. V. Corradini, C. Menozzi, C. Mariani, M.G. Betti et al., to be published.
19. Clark P.A., Brogli F., Heilbronner E. Helvetica Chim. Acta. 55:1972;1415.