Microstructure and morphology of SiOx film deposited by APCVD

Journal of Alloys and Compounds

Volumn 469, Issue 1-2, 2009, Pages 535-538

  Zhang, Ji liang ^a   Li, Jian ^a   Luo, Lai ma ^a   Wo, Yin hua ^a  

^a ZHEJIANG UNIVERSITY   (China)

Author keywords

Amorphous materials; Microstructure; TEM; Thin films; Transmission electron microscopy; Vapor deposition

Indexed keywords

ALUMINA; AMORPHOUS FILMS; ATMOSPHERIC PRESSURE; CELL GROWTH; DIFFRACTION; ELECTRON MICROSCOPES; ELECTRONS; FILM GROWTH; FILMS; GROWTH (MATERIALS); METALLIC GLASS; MICROCRYSTALLINE SILICON; MICROSTRUCTURE; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING SILICON COMPOUNDS; SILICON COMPOUNDS; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; VAPORS; X RAY ANALYSIS; X RAY DIFFRACTION ANALYSIS;

ALUMINUM SUBSTRATES; ATMOSPHERIC PRESSURE CHEMICAL VAPOR DEPOSITIONS; CRYSTALLINE ZONES; DEPOSITION PROCESSES; GROWTH MECHANISMS; GROWTH PROCESSES; HIGH RESOLUTION TRANSMISSION ELECTRONIC MICROSCOPIES; LAMINAR STRUCTURES; NON UNIFORMS; POLYCRYSTAL LINES; SCANNING ELECTRONS; SILICON RICH OXIDES; TEM; TRANSMISSION ELECTRON DIFFRACTIONS; X-RAY DIFFRACTIONS;

AMORPHOUS MATERIALS;

EID: 58249141483     PISSN: 09258388     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jallcom.2008.02.014     Document Type: Article

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