Microcrystalline silicon phase in silicon oxide thin films developed by photo-CVD technique

Thin Solid Films

Volumn 376, Issue 1-2, 2000, Pages 241-248

  Jana, Tapati ^a   Ray, Swati ^a  

^a DEPARTMENT OF MATERIALS SCIENCE   (India)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CRYSTALLINE MATERIALS; CRYSTALLIZATION; DOPING (ADDITIVES); RAMAN SPECTROSCOPY; SILICA; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

MICROCRYSTALLINE SILICON-OXYGEN ALLOY FILMS; PHOTOCHEMICAL VAPOR DEPOSITION;

AMORPHOUS FILMS;

EID: 0034318297     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(00)01211-6     Document Type: Article

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