A simple approach of preparing amorphous SiOx film on aluminum substrate

Materials Letters

Volumn 61, Issue 29, 2007, Pages 5110-5112

  Zhang, Ji Liang ^a   Li, Jian ^a  

^a ZHEJIANG UNIVERSITY   (China)

Author keywords

Amorphous SiOx film; Chemical vapor deposition; SiOx Al structure; Thin film

Indexed keywords

ALUMINUM; AMORPHOUS SILICON; ATMOSPHERIC PRESSURE; CHEMICAL VAPOR DEPOSITION; FILM THICKNESS; LOW TEMPERATURE EFFECTS; OPTIMIZATION; SCANNING ELECTRON MICROSCOPY; SILICA;

PROCESSION PARAMETERS; SOURCE GASEOUS RATIOS;

THIN FILMS;

EID: 35348886712     PISSN: 0167577X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matlet.2007.03.105     Document Type: Article

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