Atomic layer deposition of HfO2 thin films on ultrathin SiO 2 formed by remote plasma oxidation

Journal of the Korean Physical Society

Volumn 52, Issue 4, 2008, Pages 1103-1108

  Kim, Seokhoon ^a   Woo, Sanghyun ^a   Kim, Hyungchul ^a   Kim, Inhoe ^a   Lee, Keunwoo ^a   Jeong, Wooho ^a   Park, Taeyong ^a   Jeon, Hyeongtag ^a  

^a Hanyang University   (South Korea)

Author keywords

ALD; Buffer layer; High k dielectrics; Interfacial layer

Indexed keywords

EID: 43149092699     PISSN: 03744884     EISSN: None     Source Type: Journal    
DOI: 10.3938/jkps.52.1103     Document Type: Article

References (17)