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Journal of Materials Science: Materials in Electronics

Volumn 20, Issue 2, 2009, Pages 144-148

Photoluminescence from RF sputtered SiCBN thin films

(4) Vijayakumar, Arun a Warren, Andrew P b Todi, Ravi M a Sundaram, Kalpathy B a

a University of Central Florida (United States)

b UNIVERSITY OF CENTRAL FLORIDA (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALED SAMPLES; ANNEALING TEMPERATURES; CARBON CONCENTRATIONS; CHEMICAL COMPOSITIONS; DEPOSITED FILMS; DRY OXYGENS; FILM PROPERTIES; HIGH TEMPERATURES; PHOTOLUMINESCENCE PROPERTIES; PL PEAK INTENSITIES; SURFACE CHARACTERIZATIONS; X-RAY PHOTOELECTRON SPECTROSCOPIES;

ANNEALING; BORON; BORON CARBIDE; BORON NITRIDE; CARBON FILMS; CARBON NITRIDE; LIGHT EMISSION; LUMINESCENCE; NITRIDES; NONMETALS; OXYGEN; PHOTOELECTRON SPECTROSCOPY; PHOTOLUMINESCENCE; SEMICONDUCTING SILICON COMPOUNDS; SILICON CARBIDE; SPUTTER DEPOSITION; THIN FILMS; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

AMORPHOUS FILMS;

EID: 58249085905 PISSN: 09574522 EISSN: 1573482X Source Type: Journal
DOI: 10.1007/s10854-008-9667-4 Document Type: Article

Times cited : (14)

References (24)

1
- 0035858276
- P.A. Ramakrishnan, Y.T. Wang, D. Balzar, L. An, C. Haluschka, R. Riedel, A.M. Hermann, Appl. Phys. Lett. 78 (20), 3076 (2001)
- (2001) Appl. Phys. Lett. , vol.78 , Issue.20 , pp. 3076
- Ramakrishnan, P.A.¹ Wang, Y.T.² Balzar, D.³ An, L.⁴ Haluschka, C.⁵ Riedel, R.⁶ Hermann, A.M.⁷

2
- 0036748813
- V.N. Kabakeshu, J.L. Margrave, Adv. Eng. Mat. 4 (9), 671 (2002)
- (2002) Adv. Eng. Mat. , vol.4 , Issue.9 , pp. 671
- Kabakeshu, V.N.¹ Margrave, J.L.²

3
- 31044453955
- J. Vlcek, S. Potocky, J. Cizek, J. Houska, M. Kormunda, P. Zeman, V. Perina, J. Zemek, Y. Setsuhara, S. Konuma, J. Vac. Sci. Technol. A 23 (6), 1513 (2005)
- (2005) J. Vac. Sci. Technol. A , vol.23 , Issue.6 , pp. 1513
- Vlcek, J.¹ Potocky, S.² Cizek, J.³ Houska, J.⁴ Kormunda, M.⁵ Zeman, P.⁶ Perina, V.⁷ Zemek, J.⁸ Setsuhara, Y.⁹ Konuma, S.¹⁰

4
- 33947100576
- A. Vijayakumar, R.M. Todi, K.B. Sundaram, J. Electrochem. Soc. 154 (4), H271 (2007)
- (2007) J. Electrochem. Soc. , vol.154 , Issue.4
- Vijayakumar, A.¹ Todi, R.M.² Sundaram, K.B.³

5
- 0033690662
- K.B. Sundaram, J. Alizadeh, Thin Solid Films 370, 151 (2000)
- (2000) Thin Solid Films , vol.370 , pp. 151
- Sundaram, K.B.¹ Alizadeh, J.²

6
- 0342620671
- L.C. Chen, C.K. Chen, S.L. Wei, D.M. Bhusari, K.H. Chen, Y.F. Chen, Y.C. Jong, Y.S. Huang, Appl. Phys. Lett. 72, 2463 (1998)
- (1998) Appl. Phys. Lett. , vol.72 , pp. 2463
- Chen, L.C.¹ Chen, C.K.² Wei, S.L.³ Bhusari, D.M.⁴ Chen, K.H.⁵ Chen, Y.F.⁶ Jong, Y.C.⁷ Huang, Y.S.⁸

7
- 0000405356
- D.Y. Lin et al. Phys. Rev. B 56, 6498 (1997)
- (1997) Phys. Rev. B , vol.56 , pp. 6498
- Lin, D.Y.¹

8
- 84878636381
- X-ray Attenuation length, http://www-cxro.lbl.gov/optical_constants/ atten2.html
- X-ray Attenuation Length

9
- 29144455116
- T.L. Barr, S. Seal, J. Vac. Sci. Technol. A 13 (3), 1239 (1995)
- (1995) J. Vac. Sci. Technol. A , vol.13 , Issue.3 , pp. 1239
- Barr, T.L.¹ Seal, S.²

10
- 34548221525
- A. Vijayakumar, R.M. Todi, V.O. Todi, K.B. Sundaram, J. Electrochem. Soc. 154 (10), H875 (2007)
- (2007) J. Electrochem. Soc. , vol.154 , Issue.10
- Vijayakumar, A.¹ Todi, R.M.² Todi, V.O.³ Sundaram, K.B.⁴

11
- 34249865343
- A. Vijayakumar, R.M. Todi, K.B. Sundaram, J. Electrochem. Soc. 154 (7), H547 (2007)
- (2007) J. Electrochem. Soc. , vol.154 , Issue.7
- Vijayakumar, A.¹ Todi, R.M.² Sundaram, K.B.³

12
- 22544452747
- Z.D. Sha, X.M. Wu, L.J. Zhuge, Vacuum 79, 250 (2005)
- (2005) Vacuum , vol.79 , pp. 250
- Sha, Z.D.¹ Wu, X.M.² Zhuge, L.J.³

13
- 33646886858
- X.W. Du, Y. Fu, J. Sun, P. Yao, J. Appl. Phys. 99, 093503 (2006)
- (2006) J. Appl. Phys. , vol.99 , pp. 093503
- Du, X.W.¹ Fu, Y.² Sun, J.³ Yao, P.⁴

14
- 0023725736
- A.A. Galuska, J.C. Uht, N. Marquez, J. Vac. Sci. Technol. A 6, 110 (1988)
- (1988) J. Vac. Sci. Technol. A , vol.6 , pp. 110
- Galuska, A.A.¹ Uht, J.C.² Marquez, N.³

15
- 0025462995
- C. Guimon, D. Gonbeau, G.P. Guillouzo, O. Dugne, A. Guette, R. Naslain, M. Lahaye, Surf. Interface Anal. 16, 440 (1990)
- (1990) Surf. Interface Anal. , vol.16 , pp. 440
- Guimon, C.¹ Gonbeau, D.² Guillouzo, G.P.³ Dugne, O.⁴ Guette, A.⁵ Naslain, R.⁶ Lahaye, M.⁷

16
- 36549103701
- L. Muehlhoff, W.J. Choyke, M.J. Bozack, J.T. Yates, J. Appl. Phys. 60, 2842 (1986)
- (1986) J. Appl. Phys. , vol.60 , pp. 2842
- Muehlhoff, L.¹ Choyke, W.J.² Bozack, M.J.³ Yates, J.T.⁴

17
- 0032664392
- Z. Gong, E.G. Wang, G.C. Xu, Y. Chen, Thin Solid Films 348, 114 (1999)
- (1999) Thin Solid Films , vol.348 , pp. 114
- Gong, Z.¹ Wang, E.G.² Xu, G.C.³ Chen, Y.⁴

18
- 0001168621
- R.C. Lee, C.R. Aita, N.C. Tran, J. Vac. Sci. Technol. A 9, 1351 (1991)
- (1991) J. Vac. Sci. Technol. A , vol.9 , pp. 1351
- Lee, R.C.¹ Aita, C.R.² Tran, N.C.³

19
- 33744785712
- R.M. Todi, A.P. Warren, K.B. Sundaram, K.R. Coffey, J. Electrochem. Soc. 153 (7), G640 (2006)
- (2006) J. Electrochem. Soc. , vol.153 , Issue.7
- Todi, R.M.¹ Warren, A.P.² Sundaram, K.B.³ Coffey, K.R.⁴

20
- 0028388064
- A.J. Steckl, J.N. Su, J. Xu, J.P. Li, C. Yuan, P.H. Yi, H.C. Mogul, Appl. Phys. Lett. 64, 1419 (1994)
- (1994) Appl. Phys. Lett. , vol.64 , pp. 1419
- Steckl, A.J.¹ Su, J.N.² Xu, J.³ Li, J.P.⁴ Yuan, C.⁵ Yi, P.H.⁶ Mogul, H.C.⁷

21
- 36448999018
- C. Yuan, A.J. Stecklb, J. Chaudhuri, R. Thokala, M.J. Loboda, J. Appl. Phys. 78, 1271 (1995)
- (1995) J. Appl. Phys. , vol.78 , pp. 1271
- Yuan, C.¹ Stecklb, A.J.² Chaudhuri, J.³ Thokala, R.⁴ Loboda, M.J.⁵

22
- 0029406301
- L.M. Porter, R.F. Davis, Mater. Sci. Eng. B 34, 83 (1995)
- (1995) Mater. Sci. Eng. B , vol.34 , pp. 83
- Porter, L.M.¹ Davis, R.F.²

23
- 19944387304
- D.J. Qiu, Thin Solid Films 484, 90 (2005)
- (2005) Thin Solid Films , vol.484 , pp. 90
- Qiu, D.J.¹

24
- 1842740394
- B. Yao, Z.X. Shen, L. Liu, W.H. Su, J. Phys. Condens. Matter 16, 2181 (2004)
- (2004) J. Phys. Condens. Matter , vol.16 , pp. 2181
- Yao, B.¹ Shen, Z.X.² Liu, L.³ Su, W.H.⁴

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