In situ high temperature electrical characterization of RF sputtered SiCBN thin films

Journal of the Electrochemical Society

Volumn 154, Issue 10, 2007, Pages

  Vijayakumar, A ^a,c   Todi, R M ^a,b,c   Todi, V O ^a   Sundaram, K B ^a,c  

^a University of Central Florida   (United States)

^b IBM MICROELECTRONICS   (United States)

^c ELECTROCHEMICAL SOCIETY

Author keywords

[No Author keywords available]

Indexed keywords

HIGH TEMPERATURE APPLICATIONS; IN SITU PROCESSING; SHEET RESISTANCE; STRUCTURE (COMPOSITION); THERMODYNAMIC STABILITY; THIN FILMS;

COOLING CYCLES; ELECTRICAL CHARACTERIZATION; RESISTANCE READINGS;

SILICON COMPOUNDS;

EID: 34548221525     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.2768193     Document Type: Article

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