Material characterization and nanohardness measurement of nanostructured Ta-Si-N film

Surface and Coatings Technology

Volumn 188-189, Issue 1-3 SPEC.ISS., 2004, Pages 420-424

  Chung, C K ^a   Su, P J ^a  

^a NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

Author keywords

Amorphous; Cosputter; Nanoindentation; Nanostructure; Ta Si N

Indexed keywords

COATING TECHNIQUES; GRAIN SIZE AND SHAPE; NANOSTRUCTURED MATERIALS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; X RAY DIFFRACTION ANALYSIS;

GRAZING INCIDENT-ANGLE X-RAY DIFFRACTOMETER (GIAXRD); MATERIAL CHARACTERIZATION; MECHANICAL COATING; NANOIDENTATION;

TANTALUM COMPOUNDS;

COATING; FILM; HARDNESS; MEASUREMENT METHOD; NANOSTRUCTURE;

EID: 14644398605     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2004.08.043     Document Type: Article

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