Grain boundary scattering for temperature coefficient of resistance (TCR) behaviour of Ta-Si-N thin films

Journal of Physics D: Applied Physics

Volumn 41, Issue 18, 2008, Pages

  Chung, C K ^a   Nautiyal, A ^a   Chen, T S ^a   Chang, Y L ^a  

^a NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 54749089184     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/41/18/185404     Document Type: Article

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