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Volumn 201, Issue 7 SPEC. ISS., 2006, Pages 3947-3952
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Thermal stability of Ta-Si-N nanocomposite thin films at different nitrogen flow ratios
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Author keywords
Nanocomposite; Resistivity; Ta Si N; Thermal stability
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Indexed keywords
AMORPHOUS FILMS;
ANNEALING;
CRYSTAL MICROSTRUCTURE;
MAGNETRON SPUTTERING;
NANOSTRUCTURED MATERIALS;
TANTALUM COMPOUNDS;
THERMODYNAMIC STABILITY;
THIN FILMS;
MAGNETRON REACTIVE CO-SPUTTERING;
NANOHARDNESS;
NITROGEN FLOW RATIOS;
DIFFUSION COATINGS;
AMORPHOUS FILMS;
ANNEALING;
CRYSTAL MICROSTRUCTURE;
DIFFUSION COATINGS;
MAGNETRON SPUTTERING;
NANOSTRUCTURED MATERIALS;
TANTALUM COMPOUNDS;
THERMODYNAMIC STABILITY;
THIN FILMS;
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EID: 33751256866
PISSN: 02578972
EISSN: None
Source Type: Journal
DOI: 10.1016/j.surfcoat.2006.08.020 Document Type: Article |
Times cited : (17)
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References (10)
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