Effect of microstructures on the electrical and optoelectronic properties of nanocrystalline Ta-Si-N thin films by reactive magnetron cosputtering

Scripta Materialia

Volumn 57, Issue 7, 2007, Pages 611-614

  Chung, C K ^a   Chen, T S ^a  

^a NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

Author keywords

Electro optical; Nanocrystalline microstructure; PVD; Ta Si N; Thin films

Indexed keywords

ELECTRO-OPTICAL; FLOW RATIOS; NANOCRYSTALLINE MICROSTRUCTURE; REACTIVE COSPUTTERING; TA-SI-N;

AMORPHOUS ALLOYS; ELECTRIC CONDUCTIVITY; MAGNETRON SPUTTERING; MICROSTRUCTURE; NANOCOMPOSITES; NANOCRYSTALLINE ALLOYS; NITROGEN; OPTOELECTRONIC DEVICES; POLYCRYSTALLINE MATERIALS; THIN FILMS;

TANTALUM ALLOYS;

EID: 34447643042     PISSN: 13596462     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.scriptamat.2007.06.011     Document Type: Article

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