XPS depth-profile of the suboxide distribution at the native oxide/Ta interface

Journal of Electron Spectroscopy and Related Phenomena

Volumn 169, Issue 1, 2009, Pages 41-45

  Khanuja, Manika ^a,b   Sharma, Himani ^b   Mehta, B R ^a   Shivaprasad, S M ^b  

^a INDIAN INSTITUTE OF TECHNOLOGY DELHI   (India)

^b NATIONAL PHYSICAL LABORATORY   (India)

Author keywords

Ion bombardment; Tantalum; Tantalum oxide; X ray photoelectron spectroscopy (XPS)

Indexed keywords

ELECTRON SPECTROSCOPY; ION BEAMS; ION BOMBARDMENT; IONS; METALLIC COMPOUNDS; PHOTOELECTRICITY; PHOTOELECTRON SPECTROSCOPY; PHOTOIONIZATION; PHOTONS; SPECTRUM ANALYSIS; TANTALUM; TANTALUM COMPOUNDS; TRANSITION METALS;

BEAM ENERGIES; BEAM IRRADIATIONS; CORE LEVELS; GRADED DISTRIBUTIONS; GROWTH METHODS; NATIVE OXIDES; OXIDE LAYERS; PAPER ADDRESSES; POLYCRYSTAL LINES; PROFILE STUDIES; SYNTHESIS METHODS; TANTALUM OXIDE; VALENCE BAND SPECTRUMS; VALENCE STATES; X-RAY PHOTOELECTRON SPECTROSCOPY (XPS);

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 58149336779     PISSN: 03682048     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.elspec.2008.10.004     Document Type: Article

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