Growth of in-catalyzed silicon nanostructures by hydrogen radical-assisted deposition method: Effect of substrate temperatures

Journal of Nanoscience and Nanotechnology

Volumn 8, Issue 10, 2008, Pages 5188-5192

  Jeon, Minsung ^a   Kamisako, Koichi ^a  

^a TOKYO UNIVERSITY OF AGRICULTURE AND TECHNOLOGY   (Japan)

Author keywords

Hydrogen Radical; Indium Catalyst; Nanoparticles; Silicon Nanowires

Indexed keywords

ASSISTED DEPOSITIONS; CATALYST NANOPARTICLES; CRYSTAL DIFFRACTIONS; DEPOSITION METHODS; HYDROGEN RADICAL TREATMENTS; HYDROGEN RADICALS; INDIUM OXIDE FILMS; METAL OXIDES; SILICON NANO STRUCTURES; SILICON NANOWIRES; SPHERICAL STRUCTURES; SUBSTRATE TEMPERATURES; SYNTHESIS TEMPERATURES;

CATALYSIS; ELECTRIC WIRE; GROWTH (MATERIALS); HYDROGEN; INDIUM; METALLIC COMPOUNDS; NANOPARTICLES; NANOSTRUCTURES; NANOWIRES; OXIDE FILMS; SILICON; SUBSTRATES; SYNTHESIS (CHEMICAL);

NONMETALS;

EID: 58149263400     PISSN: 15334880     EISSN: None     Source Type: Journal    
DOI: 10.1166/jnn.2008.1005     Document Type: Conference Paper

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