In situ preparation of an ultra-thin nanomask on a silicon wafer

Nanotechnology

Volumn 20, Issue 2, 2009, Pages

  Mao, R W ^a   Lin, S K ^a   Tsai, C S ^a,b  

^a Irvine   (United States)

^b NATIONAL TAIWAN UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; FILM PREPARATION; INSULATION; POROUS SILICON; SEMICONDUCTING SILICON COMPOUNDS; SEMICONDUCTOR JUNCTIONS;

ALUMINUM FILMS; ANODIZATION; ANODIZATION PROCESSES; ELECTROLYTE INTERFACES; IN SITU PREPARATIONS; IN-SITU; NANO MASKS; NANOSCALE; P-N JUNCTIONS; SILICON ON INSULATORS; SIMULATED RESULTS; VIVID COLORS;

SILICON WAFERS;

ALUMINUM; ELECTROLYTE; SILICON;

AIR; ARTICLE; COLOR; COMPUTER MODEL; INSULATOR ELEMENT; NANOTECHNOLOGY; POROSITY; PRIORITY JOURNAL;

EID: 58149252183     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/20/2/025301     Document Type: Article

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