Fabrication of nanohole array on Si using self-organized porous alumina mask

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 19, Issue 5, 2001, Pages 1901-1904

  Shingubara, Shoso ^a   Okino, Osamu ^a   Murakami, Yasuhiko ^a   Sakaue, Hiroyuki ^a   Takahagi, Takayuki ^a  

^a HIROSHIMA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; ANODIC OXIDATION; ASPECT RATIO; ETCHING; FABRICATION; MASKS; POROUS MATERIALS; SEMICONDUCTING SILICON; SPUTTERING; SUBSTRATES;

POROUS ALUMINA MASKS;

ULSI CIRCUITS;

EID: 0035526794     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1403442     Document Type: Article

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