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Volumn 1, Issue 9, 2008, Pages 0970011-0970013
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Flexible nanofabrication in three-dimensional electron-beam lithography enhanced by suppression of proximity effect
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Author keywords
[No Author keywords available]
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Indexed keywords
ELECTRON ENERGY LOSS SPECTROSCOPY;
ESTERS;
PHOTORESISTS;
THREE DIMENSIONAL;
3D NANOSTRUCTURES;
BUFFER REGIONS;
CUT OFFS;
EB WRITINGS;
HIGH ASPECT RATIOS;
NANOFABRICATION;
POLIES (METHYL METHACRYLATE);
POSITIVE RESISTS;
PROXIMITY EFFECTS;
STRUCTURAL FLEXIBILITIES;
ASPECT RATIO;
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EID: 57649109230
PISSN: 18820778
EISSN: 18820786
Source Type: Journal
DOI: 10.1143/APEX.1.097001 Document Type: Article |
Times cited : (7)
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References (15)
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