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Volumn 1, Issue 9, 2008, Pages 0970011-0970013

Flexible nanofabrication in three-dimensional electron-beam lithography enhanced by suppression of proximity effect

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON ENERGY LOSS SPECTROSCOPY; ESTERS; PHOTORESISTS; THREE DIMENSIONAL;

EID: 57649109230     PISSN: 18820778     EISSN: 18820786     Source Type: Journal    
DOI: 10.1143/APEX.1.097001     Document Type: Article
Times cited : (7)

References (15)
  • 4
    • 12144291212 scopus 로고    scopus 로고
    • R. Kometani, T. Morita, K. Watanabe, T. Hoshino, K. Kondo, K. Kanda, Y. Haruyama, T. Kaito, J. Fujita, M. Ishida, Y. Ochiai, and S. Matsui: J. Vac. Sci. Tcchnol. B 22 (2004) 257.
    • R. Kometani, T. Morita, K. Watanabe, T. Hoshino, K. Kondo, K. Kanda, Y. Haruyama, T. Kaito, J. Fujita, M. Ishida, Y. Ochiai, and S. Matsui: J. Vac. Sci. Tcchnol. B 22 (2004) 257.
  • 14
    • 57649098324 scopus 로고    scopus 로고
    • K. Yamazaki: Nanofabricaikm-Fundamemals and Applications, ed. A. A. Tseng (World Scientific, Singapore, 2008) Chap. 10, pp. 343-347, 354-356.
    • K. Yamazaki: Nanofabricaikm-Fundamemals and Applications, ed. A. A. Tseng (World Scientific, Singapore, 2008) Chap. 10, pp. 343-347, 354-356.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.