Modulation of young's modulus of poly(methyl methacrylate) nanobeam due to electron-beam exposure

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 46, Issue 45-49, 2007, Pages

  Yamazaki, Kenji ^a   Yamaguchi, Toru ^a   Yamaguchi, Hiroshi ^a  

^a Kashino Diverse Brain Research Laboratory of NTT Communication Science Laboratories   (Japan)

Author keywords

EB exposure; EB lithography; Elastic modulus; Nanomechanics; Nanostructure; NEMS; PMMA

Indexed keywords

ELASTIC MODULI; ELASTICITY; ESTERS; MODULATION;

DEVELOPMENT PROCESSES; EB EXPOSURE; EB LITHOGRAPHY; NANOELECTRO-MECHANICAL SYSTEMS; ORGANIC MATERIALS; PMMA; POLY(METHYL METHACRYLATE); SURFACE REGIONS; YOUNG'S MODULUS;

ELECTRON BEAM LITHOGRAPHY;

EID: 54249089415     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.46.L1225     Document Type: Article

References (15)

1. D. Ruger, R. Budakian, H. J. Mamin, and B. W. Chui: Nature 430 (2004) 329.
2. X. M. H. Huang, C. A. Zorman, M. Mehregany, and M. L. Roukes: Nature 421 (2003) 496.
3. H. Yamaguchi, Y. Hirayama, S. Miyashita, and S. Ishihara: Appl. Phys. Lett. 86 (2005) 052106.
4. S. Kawata, H. Sun, T. Tanaka, and K. Takeda: Nature 412 (2001) 697.
5. F. Romanato, L. Businaro, L. Vaccari, S. Cabrini, P. Candeloro, M. De Vittorio, A. Passaseo, M. T. Todaro, R. Cingolani, E. Cattaruzza, M. Galli, C. Andreani, and E. Di Fabrizio; Microlectron. Eng. 67-68 (2003) 479.
6. H. Sato, T. Kakimura, J. S. Go, and S. Shoji: Proc. 16th Int. Conf. Micro Electro Mechanical Systems (IEEE, Piscataway. NJ, 2003) p. 223.
7. K. Yamazaki and H. Namatsu: Microelectron. Eng. 73-74 (2004) 85.
8. K. Yamazaki, T. Yamaguchi, and H. Namatsu: Jpn. J. Appl. Phys. 43 (2004) L1111.
9. K. Yamazaki and H. Namatsu: Tech. Dig. 17th Int. Conf. Micro Electro Mechanical Systems (IEEE, Piscataway, NJ, 2004) p. 609.
10. V. S. Ivanov: Radiation Chemistry of Polymers (VSP BV, The Netherlands, 1992) p. 176.
11. P. A. O'Rourke Muisener, L. Clayton, J. D'Angelo, J. P. Harmon, A. K. Sikder, A. Kumar, A. M. Cassell, and M. Meyyappan: J. Mater. Res. 17 (2002) 2507.
12. R. N. Leach, F. Stevens, C. Seiler, S. C. Langford, and J. T. Dickinson: Langmuir 19 (2003) 10225.
13. B. J. Briscoe, L. Fiori, and E. Pelillo: J. Phys. D 31 (1998) 2395.
14. C. M. Stafford, B. D. Vogt, C. Harrison, D. Julthongpiput, and R. Huang: Macromolecules 39 (2006) 5095.
15. K. Kurihara, K. Iwadate, H. Namatsu, M. Nagase, H. Takenaka, and K. Murase: Jpn. J. Appl. Phys. 34 (1995) 6940.