The synthesis of novel ester acetal polymers and their application for chemically amplified positive i-line photoresist

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6923, Issue , 2008, Pages

  Wang, Liyuan ^a   Huo, Yongen ^a   Kong, Fanrong ^a  

^a BEIJING NORMAL UNIVERSITY   (China)

Author keywords

Acidolysis; Ester acetal polymer aromatic dicarboxylic acid divinyl ether; PAG; Positive i line photoresist

Indexed keywords

AROMATIC COMPOUNDS; AROMATIC POLYMERS; ATMOSPHERIC AEROSOLS; ESTERIFICATION; ESTERS; ETHERS; MANGANESE; MANGANESE COMPOUNDS; ORGANIC COMPOUNDS; ORGANIC POLYMERS; ORGANIC SOLVENTS; PHENOLIC RESINS; PHENOLS; PHOTORESISTORS; POLYMERS; RESINS; SOLVENTS; SURFACE TREATMENT; TURBULENT FLOW;

ACIDOLYSIS; AROMATIC DICARBOXYLIC ACIDS; DIVINYL ETHERS; GOOD SOLUBILITIES; HIGH THERMAL STABILITIES; HIGHER TEMPERATURES; PAG; POSITIVE I-LINE PHOTORESIST; ROOM TEMPERATURES; S TRIAZINES; SYNTHESIS OF;

PHOTORESISTS;

EID: 57349170194     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.773577     Document Type: Conference Paper

References (14)

1. Frechet, J. M. J., Ito, H., Willson, C. G., "Sensitive Deep UV Resist Incorporating Chemical Amplification," Proc. Microcircuit Eng., 260 (1982)
2. Frechet, J. M. J., Eichler, E., Willson, C. G., Ito, H., "Poly(p-t- butoxycarbonyl styrene): a Convenient Precursor to p-hydroxystyrene Resins," Polymer, 24, 995-1000 (1983)
3. Reichmanis, E., Nalamasu, O., Houlihan, F. M., "Organic Materials Challenges for 193 nm Imaging," Acc. Chem. Res., 32, 659-667 (1999)
4. Okoroanyanwu, U., Shimokawa, T., Byers, J., Willson, C. G., "Alicyclic Polymers for 193 nm Resist Applications: Synthesis and Characterization," Chem. Mater., 10, 3319-3327 (1998)
5. Noppakundilograt, S., Miyagawa, N., Takahara, S., Yamaoka, T., "Visible Light-Sensitive positive-Working Photopolymer Based on Poly(p-hydroxystyrene) and Vinyl Ether Crosslinker," J. Photopolym. Sci. Technol., 13(5), 719 (2000)
6. Tsuchiya, K., Shibasaki, Y., Ueda, M., "A positive type alkaline developable thermally stable and photosensitive polymer based on partially O-methylated poly (2,6-dihydroxy-1,5-naphthylene), an acidolytic de-cross-linker, and a photoacid generator," Polymer, 45, 6873-6878 (2004)
7. Moon, S., Kamenosono, K., Kondo, S., Umehara, A., Yamaoka, T., "Three-Component Photopolymers Based on Thermal Crosslinking and Acidolytic De-Crosslinking of Vinyl Ether Groups. Effects of Binder Polymers on Photopolymer Characteristics," Chem. Mater., 6, 1854-1860 (1994)
8. Moon, S., Koo, J.S., Oh, S. H., Lee, S. K., Kang, S. E., "Novel Deep UV Photoresist Based On Thermal Cross-Linking and De-Cross-Linking of Cross-Linkable Photoacid Generator," J. Photopolym. Sci. Technol., 11 (3), 439-443 (1998)
9. Song, S., Chang, S., Takahara, S., Yamaoka, T., "Tetrahydropyranyl- protected poly(p -hydroxystyrene) containing vinyl ether compound for three-component photopolymers," Polymer for Advanced Technology, 9, 579-587 (1998)
10. Moon, S., "Three-component photoresists containing thermally crosslinkable vinyl ether derivatives," Journal of Applied Polymer Science, 81, 3399 (2001)
11. Lee, J. S., Suzuki, H., Odoi, K., Miyagawa, N., Takahara, S., Yamaoka, T., "Performance of vinyl ether cross-linkers on resist for 193-nm lithography," Proc. SPIE, 4690, 541-548 (2002)
12. Watanabe, H., Maeshima, K., Aoai, T., et al, "Divinyloxyalkane Cross-linker on DUV Photoresist," J. Photopolym. Sci. Technol., 11 (3), 537-540 (1998)
13. Wang, L.Y., Zhai, X.X., Huo, Y.E., "Novel 193-nm positive photoresist composed of ester acetal polymer without phenyl group," Proc. SPIE, 6519, 65192H-1 (2007)
14. Wang, L. Y., Chu, Z.X., Cheng, L., "Two-component photoresists based on acidolytic cleavage of novel ester acetal polymer ," Proc. SPIE, 6519, 651921-1 (2007)