Two-component photoresists based on acidolytic cleavage of novel ester acetal polymer

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6519, Issue PART 2, 2007, Pages

  Wang, Liyuan ^a   Chu, Zhanxing ^a   Cheng, Long ^a  

^a BEIJING NORMAL UNIVERSITY   (China)

Author keywords

Acrylpimaric acid; Divinyl ether; Ester acetal polymer; PAG; Positive photoresist

Indexed keywords

ETHERS; MOLECULAR WEIGHT; ORGANIC ACIDS; ORGANIC POLYMERS; ORGANIC SOLVENTS; THERMODYNAMIC STABILITY;

ACRYLPIMARIC ACID; DIVINYL ETHERS; ESTER ACETAL POLYMERS; POSITIVE PHOTORESISTS;

PHOTORESISTS;

EID: 35048865822     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.711701     Document Type: Conference Paper

References (10)

1. K. Tsuchiya, Y. Shibasaki, M. Ueda; Polymer, 2004, 45, 6873-6878
2. S. Noppakundilograt, N. Miyagawa, S. Takahara, et al; Journal of Photopolymer Science and Technology, 2000, 13(5), 719-722
3. S. Moon, J. Koo, S.Oh, et al; Journal of Photopolymer Science and Technology, 1998, 11(3), 439-444
4. S. Moon, K. Kamenosono, S. Kondo, et al; Chem. Mater., 1994, 6, 1854-1860
5. H. Watanabe, K. Maeshima, T. Aoai, etal; Journal of Photopolymer Science and Technology, 1998, 11(3), 537-540
6. Liyuan Wang, Xin Guo, Zhanxing Chu; Proc. SPIE, 6153, 615329, 2006
7. Hui Xie, Zhi Cheng; Chemistry and Industry of Forest Product, 1998, 18(3), 67-73
8. Noah J. Halbrook, Ray V. Lawrence, Robert L. Dressler, et al, J.O.C.(1964), 29, 5, 1017-21
9. J. V. Crivello, D.A. Conlon; Journal of Polymer Science: Polymer Chemistry Edition, 1983, 21, 1785-1799
10. Wenjun Wang, Huamin Li, Liyuan Wang;Photographic Science and Photochemistry, 2005, 23(1), 48-54