Performance of vinyl ether cross-linkers on resist for 193 nm lithography

Proceedings of SPIE-The International Society for Optical Engineering

Volumn 4690 I, Issue , 2002, Pages 541-548

  Lee, Jong Soo ^a   Suzuki, Hideo ^b   Odoi, Keisuke ^b   Miyagawa, Nobukazu ^a   Takahara, Shigeru ^a   Yamaoka, Tsuguo ^a  

^a CHIBA UNIVERSITY   (Japan)

^b NISSAN CHEMICAL INDUSTRIES LTD   (Japan)

Author keywords

Acid diffusion; Cross linking density; Dry etching resistance; Positive working; Tricyclodecane; Vinyl ether cross linker

Indexed keywords

CROSSLINKING; DRY ETCHING; ETHERS; EXCIMER LASERS; IRRADIATION; SEMICONDUCTOR DEVICE MANUFACTURE; ULTRAVIOLET RADIATION;

DRY ETCHING RESISTANCE;

PHOTORESISTS;

EID: 0036030253     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.474254     Document Type: Article

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