Novel deep UV photoresist based on thermal cross-linking and de-cross-linking of cross-linkable photoacid generator

Journal of Photopolymer Science and Technology

Volumn 11, Issue 3, 1998, Pages 439-444

  Moon, Seong Yun ^a   Koo, Jae Sun ^a   Oh, Seung Hun ^a   Lee, Sang Kyun ^a   Kang, Shin Ee ^a  

^a Samsung Advanced Institute of Technology (SAIT)   (South Korea)

Author keywords

Deep uv; Positive working photoresist; Sulfonium salt; Vinyl ether group

Indexed keywords

EID: 0000519345     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.11.439     Document Type: Article

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