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Journal of Applied Polymer Science

Volumn 81, Issue 14, 2001, Pages 3399-3404

Three-component photoresists containing thermally crosslinkable vinyl ether derivatives

(1) Moon, Seong Yun a,b

a Samsung Advanced Institute of Technology (SAIT) (South Korea)

b TAKASAKI ADVANCED RADIATION RESEARCH INSTITUTE (Japan)

Author keywords

Acidolytic cleavage; Photoacid generator; Photoresist; Thermal crosslinking; Vinyl ether group

Indexed keywords

CROSSLINKING; DECOMPOSITION; MONOMERS; PHOTORESISTS; SOLUBILITY; SYNTHESIS (CHEMICAL); TEMPERATURE;

ACIDOLYTIC CLEAVAGE; CHEMICAL AMPLIFICATION; PHOTOACID GENERATOR; POLYHYDROXYSTYREMETHOXYSTYRENE; VINYL ETHER GROUP;

ORGANIC POLYMERS;

FILM;

EID: 0035968649 PISSN: 00218995 EISSN: None Source Type: Journal
DOI: 10.1002/app.1796 Document Type: Article

Times cited : (2)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.