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Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 26, Issue 6, 2008, Pages 2345-2350

Resist charging effect in photomask: Its impact on pattern placement error and critical dimension

(5) Choi, Jin a Nam, Dong Seok a Kim, Byung Gook a Woo, Sang Gyun a Cho, Han Ku a

a SAMSUNG Electronics (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

PHOTOLITHOGRAPHY;

CHARGING EFFECTS; CORRECTION METHODS; CRITICAL DIMENSION VARIATIONS; CRITICAL DIMENSIONS; DOUBLE EXPOSURES; DOUBLE PATTERNING; FEP-171; PATTERN DENSITIES; PATTERN PLACEMENT ERRORS; PATTERN POSITIONS; PATTERN SHAPES; POSITION ERRORS; WAFER PATTERNS;

HOLOGRAMS;

EID: 57249104985 PISSN: 10711023 EISSN: None Source Type: Journal
DOI: 10.1116/1.2978406 Document Type: Article

Times cited : (4)

References (14)

1
- 57249114012
- International Technology Roadmafor Semiconductors, edition
- International Technology Roadmap for Semiconductors, 2007 edition, http://public.itrs.net
- (2007)

2
- 28544452442
- Y. Y. Chang, Y.-H. Wu, C.-L. Shih, J. Lin, F. Kan, and J. Lin, Proc. SPIE 5853, 757 (2005).
- (2005) Proc. SPIE , vol.5853 , pp. 757
- Chang, Y.Y.¹ Wu, Y.-H.² Shih, C.-L.³ Lin, J.⁴ Kan, F.⁵ Lin, J.⁶

3
- 33644610615
- S. Hsu, J. Park, D. Van Den Broeke, and J. F. Chen, Proc. SPIE 5992, 59921Q (2005).
- (2005) Proc. SPIE , vol.5992
- Hsu, S.¹ Park, J.² Van Den Broeke, D.³ Chen, J.F.⁴

4
- 45549109962
- H. Sewell, Proc. SPIE 6924, 692415 (2008).
- (2008) Proc. SPIE , vol.6924 , pp. 692415
- Sewell, H.¹

5
- 79959357002
- B. LaFontaine, Proc. SPIE 6921, 69210P (2008).
- (2008) Proc. SPIE , vol.6921
- Lafontaine, B.¹

6
- 45549083621
- Mircea Dusa, B. Arnold, J. Finders, H. Meiling, K. van Ingen Schenau, and A. C. Chen, Proc. SPIE 7028, 702810 (2008).
- (2008) Proc. SPIE , vol.7028 , pp. 702810
- Dusa, M.¹ Arnold, B.² Finders, J.³ Meiling, H.⁴ Van Ingen Schenau, K.⁵ Chen, A.C.⁶

7
- 44949262881
- R. de Kruif, K. Bubke, G.-J. Janssen, E. van der Heijden, J. Fochler, M. Dusa, J. H. Peters, P. de Haas, and B. Connolly, Proc. SPIE 6792, 679204 (2008).
- (2008) Proc. SPIE , vol.6792 , pp. 679204
- De Kruif, R.¹ Bubke, K.² Janssen, G.-J.³ Van Der Heijden, E.⁴ Fochler, J.⁵ Dusa, M.⁶ Peters, J.H.⁷ De Haas, P.⁸ Connolly, B.⁹

8
- 42149143738
- J. Choi, H. B. Kim, S. H. Lee, D. H. Lee, H. Y. Jeong, J. W. Lee, B. G. Kim, S.-G. Woo, and H. K. Cho, Proc. SPIE 6730, 67301O (2007).
- (2007) Proc. SPIE , vol.6730
- Choi, J.¹ Kim, H.B.² Lee, S.H.³ Lee, D.H.⁴ Jeong, H.Y.⁵ Lee, J.W.⁶ Kim, B.G.⁷ Woo, S.-G.⁸ Cho, H.K.⁹

9
- 45549109951
- J. Choi, S. H. Lee, D. Nam, B. G. Kim, S.-G. Woo, and H. K. Cho, Proc. SPIE 7028, 70281X (2008).
- (2008) Proc. SPIE , vol.7028
- Choi, J.¹ Lee, S.H.² Nam, D.³ Kim, B.G.⁴ Woo, S.-G.⁵ Cho, H.K.⁶

10
- 45749101683
- N. Nakayamada, S. Wake, T. Kamikubo, H. Sunaoshi, and S. Tamamushi, Proc. SPIE 7028, 70280C (2008).
- (2008) Proc. SPIE , vol.7028
- Nakayamada, N.¹ Wake, S.² Kamikubo, T.³ Sunaoshi, H.⁴ Tamamushi, S.⁵

11
- 57249114011
- B. Alles, E. Cotte, B. Simeon, and T. Wandel, Proc. SPIE 6924, 62244P (2008).
- (2008) Proc. SPIE , vol.6924
- Alles, B.¹ Cotte, E.² Simeon, B.³ Wandel, T.⁴

12
- 1642514816
- Masahiro Hashimoto, Proc. SPIE 5130, 144 (2003).
- (2003) Proc. SPIE , vol.5130 , pp. 144
- Hashimoto, M.¹

13
- 19844372783
- M. Hashimoto, T. Yamada, M. Sakamoto, M. Hara, Y. Ohkubo II, and M. Ushida, Proc. SPIE 5567, 974 (2004).
- (2004) Proc. SPIE , vol.5567 , pp. 974
- Hashimoto, M.¹ Yamada, T.² Sakamoto, M.³ Hara, M.⁴ Ii, O.Y.⁵ Ushida, M.⁶

14
- 42149091260
- T. Kamikubo, R. Nishimura, K. Tsuruta, K. Hattori, J. Takamatsu, S. Yoshitake, H. Nozue, H. Sunaoshi, and S. Tamamushi, Proc. SPIE 6730, 673031 (2007).
- (2007) Proc. SPIE , vol.6730 , pp. 673031
- Kamikubo, T.¹ Nishimura, R.² Tsuruta, K.³ Hattori, K.⁴ Takamatsu, J.⁵ Yoshitake, S.⁶ Nozue, H.⁷ Sunaoshi, H.⁸ Tamamushi, S.⁹

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