Wafer based mask characterization for double patterning lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6792, Issue , 2008, Pages

  De Kruif, Robert ^a   Bubke, Karsten ^b   Janssen, Gert Jan ^a   Van Der Heijden, Eddy ^a   Fochler, Jörg ^d   Dusa, Mircea ^c   Peters, Jan Hendrik ^b   De Haas, Paul ^a   Connolly, Brid ^d  

^a ASML   (Netherlands)

^b Advanced Mask Technology Center GmbH and Co KG   (Germany)

^c ASML US Inc   (United States)

^d Toppan Photomasks Inc   (United States)

Author keywords

Double patterning; Mask metrology; Overlay; Wafer metrology

Indexed keywords

ARCHITECTURAL DESIGN; COMPUTER NETWORKS; LITHOGRAPHY; MEASUREMENTS; MICROFLUIDICS; MULTITASKING; NANOTECHNOLOGY; NUMERICAL METHODS; PAPER; PROCESS DESIGN; PROCESS ENGINEERING; STANDARDS; TARGETS; TECHNOLOGY; TITRATION;

(E ,3E) PROCESS; (P ,P ,T) MEASUREMENTS; APPLIED (CO); BAR IN BAR; DOUBLE EXPOSURE; DOUBLE PATTERNING; EUROPEAN; EXPOSURE TOOLS; INTRA FIELD; LINE PROCESS; ON-WAFER; TECHNICAL CHALLENGES; WAFER FAB;

OPTICAL INSTRUMENTS;

EID: 44949262881     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.798515     Document Type: Conference Paper

References (2)

1. M.Dusa, J.Quaedeckers, O.Larsen, J.Meessen, E. van der Heijden, G.Dicker, O.Wismans, P. de Haas, K.van Ingen Schenau, J.Finders, B.Vleeming, G.Stroms, P.Jaenen, S.Cheng, M.Maenhoudt, "Pitch doubling through dual-patterning lithography challenges in integration and litho budgets", Proceedings of the SPIE, Vol. 6520, 2007
2. K.Bubke, E.Cotte, J.H.Peters, R. de Kruif, M.Dusa, J.Fochler, B.Connolly, 'Mask Characterization for Double Patterning Lithography', Proceedings of BACUS symposium on Photomask technology, 2007