Nickel silicides and germanides: Phases formation, kinetics and thermal expansion

Materials Science and Engineering: B

Volumn 154-155, Issue 1-3, 2008, Pages 163-167

  Perrin, C ^a,b   Mangelinck, D ^a,b   Nemouchi, F ^a,b   Labar, J ^c   Lavoie, C ^d   Bergman, C ^a,b   Gas, P ^a,b  

^a AIX MARSEILLE UNIVERSITÉ   (France)

^b CNRS   (France)

^c RESEARCH INSTITUTE FOR TECHNICAL PHYSICS AND MATERIALS SCIENCE   (Hungary)

^d IBM T J WATSON RESEARCH CENTER   (United States)

Author keywords

Germanides; Kinetics; Linear parabolic; Silicides; Solid state reaction; Thin films

Indexed keywords

DIFFERENTIAL SCANNING CALORIMETRY; GERMANIUM; KINETICS; LATTICE CONSTANTS; NICKEL COMPOUNDS; REACTION KINETICS; SI-GE ALLOYS; SILICIDES; SOLID STATE REACTIONS; THERMAL EXPANSION; X RAY DIFFRACTION;

GE CONCENTRATIONS; GERMANIDES; IN-SITU X-RAY DIFFRACTION; LINEAR-PARABOLIC; NEGATIVE THERMAL EXPANSION COEFFICIENTS; NICKEL SILICIDE; PHASE FORMATIONS; SOLID-STATE REACTIONS; THIN-FILMS; X-RAY DIFFRACTION MEASUREMENTS;

THIN FILMS;

EID: 57149110414     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mseb.2008.09.042     Document Type: Article

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