Nano-phase titanium dioxide thin film deposited by repetitive plasma focus: Ion irradiation and annealing based phase transformation and agglomeration

Applied Surface Science

Volumn 255, Issue 5 PART 2, 2008, Pages 2932-2941

  Rawat, R S ^a   Aggarwal, V ^a   Hassan, M ^b   Lee, P ^a   Springham, S V ^a   Tan, T L ^a   Lee, S ^a  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

^b GC UNIVERSITY   (Pakistan)

Author keywords

Crystalline titanium dioxide; Nano phase; Repetitive plasma focus device

Indexed keywords

AGGLOMERATION; ANNEALING; CRYSTALLINE MATERIALS; DEPOSITION; ION BOMBARDMENT; IONS; OXIDE MINERALS; PLASMA DEVICES; SCANNING ELECTRON MICROSCOPY; THIN FILMS; X RAY DIFFRACTION;

ANNEALING TEMPERATURES; CRYSTALLINE TITANIUM DIOXIDE; NANO-PHASE; PLASMA FOCUS DEVICES; REPETITIVE PLASMA FOCUS DEVICE; SCANNING ELECTRON MICROGRAPHS; SILICON SUBSTRATES; TITANIUM DIOXIDE THIN FILM;

TITANIUM DIOXIDE;

EID: 57149102663     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2008.08.055     Document Type: Article

References (46)

1. Huang N., Chen Y.R., Luo J.M., Yi J., Lu R., Xiao J., Xue Z.N., and Liu X.H. J. Biomater. Appl. 8 (1994) 404
2. Xu N., Shi Z., Fan Y., Dong J., Shi J., and Hu C. Ind. Eng. Chem. Res. 38 (1999) 373
3. Wang C.C., Zhang Z., and Ying J.Y. Nanostruct. Mater. 9 (1997) 583
4. B.S. Richards, J.E. Cotter, C.B. Honsberg, S.R. Wenham, Conference Record of the Twenty-Eighth IEEE Photovoltaic Specialists Conference 2000 (Cat. No. 00CH37036) (2000) 375.
5. Mardare D., Tascab M., Delibasa M., and Rusu G.I. Appl. Surf. Sci. 156 (2000) 200
6. Löbl P., Huppertz M., and Mergel D. Thin Solid Films 251 (1994) 72
7. Vydianathan K., Nuesca G., Peterson G., Eisenbraun E.T., Kaloyeros A.E., Sullivan J.J., and Han B. J. Mater. Res. 16 (2001) 1838
8. Xu W.X., Zhu S., and Fu X.C. Appl. Surf. Sci. 136 (1998) 194
9. Zhang S., Zhu Y.F., and Brodie D.E. Thin Solid Films 213 (1992) 265
10. Mardare D., and Stancu A. Mater. Res. Bull. 35 (2000) 2017
11. Rothschild A., Edelman F., Komem Y., and Cosandey F. Sens. Actuators B: Chem. 67 (2000) 282
12. Zheng S.K., Wang T.M., Xiang G., and Wang C. Vacuum 62 (2001) 361
13. Chow L.L.W., Yuen M.M.F., Chan P.C.H., and Cheung A.T. Sens. Actuators B: Chem. 76 (2001) 310
14. Okimura K., Maeda N., and Shibata A. Thin Solid Films 281-282 (1996) 427
15. Barnes M.C., Kumar S., Green L., Hwang N.M., and Gerson A.R. Surf. Coat. Technol. 190 (2005) 321
16. Lee S., Tou T.Y., Moo S.P., Eissa M.A., Gholap A.V., Kwek K.W., Mulyodrono S., Smith A.J., Suryadi W., and Zakaullah U.M. Am. J. Phys. 56 (1988) 62
17. Ahmad S., Sadiq M., Hussain S., Shafiq M., Zakaullah M., and Waheed A. Rev. Sci. Instrum. 77 (2006) 013504-13508
18. Bhuyan H., Favre M., Valderrama E., Chuaqui H., and Wyndham E. J. Phys. D: Appl. Phys. 39 (2006) 3596
19. Ahmad S., Hussain S.S., Sadiq M., Shafiq M., Waheed A., and Zakaullah M. Plasma Phys. Control Fusion 48 (2006) 745
20. Lee S., Lee P., Zhang G., Serban A., Liu M., Feng X., Springham S.V., Selvam C., Kudryashov V., Wong T.K.S., and Sing. J. Phys. 14 (1998) 1
21. Rawat R.S., Srivastava M.P., Tandon S., and Mansingh A. Phys. Rev. B 47 (1993) 4858
22. Sagar R., and Srivastava M.P. Phys. Lett. A 183 (1993) 209
23. Agarwal P., Annapoorni S., Srivastava M.P., Rawat R.S., and Chauhan P. Phys. Lett. A 231 (1997) 434
24. Srivastava M.P., Mohanty S.R., Annapoorni S., and Rawat R.S. Phys. Lett. A 215 (1996) 63
25. Rawat R.S., Arun P., Videshwar A.G., Lam Y.L., Lee P., Liu M.H., Lee S., and Huan A.C.H. Mater. Res. Bull. 35 (2000) 477
26. Rawat R.S., Arun P., Videshwar A.G., Lee P., and Lee S. J. Appl. Phys. 95 (2004) 7725
27. Borthakur T.K., Sahu A., Mohanty S.R., Nayak B.B., and Acharya B.S. Surf. Eng. 15 (1999) 55
28. Gupta R., and Srivastava M.P. Plasma Sources Sci. Technol. 13 (2004) 371
29. Kant C.R., Srivastava M.P., and Rawat R.S. Phys. Lett. A 226 (1997) 212
30. Fink J., Heinzerling T.M., Pfluger J., Scheerer B., Dichler B., and Koidl P. Phys. Rev. B 30 (1984) 4713
31. Kant C.R., Srivastava M.P., and Rawat R.S. Phys. Lett. A 239 (1998) 109
32. Rawat R.S., Lee P., White T., Ling L., and Lee S. Surf. Coat. Technol. 138 (2001) 159
33. Rawat R.S., Chew W.M., Lee P., White T., and Lee S. Surf. Coat. Technol. 173 (2003) 276
34. Hassan M., Qayyum A., Ahmad R., Murtaza G., and Zakaullah M. J. Phys. D: Appl. Phys. 40 (2007) 769
35. Takao K., Honda T., Kitamura I., and Masugata K. Plasma Sources Sci. Technol. 12 (2003) 407
36. Kies W., Decker G., Berntien U., Sidelnikov Yu.V., Glushkov D.A., Koshelev K.N., Simanovskii D.M., and Babashev S.V. Plasma Sources Sci. Technol. 9 (2000) 279
37. Rhee M.J. Appl. Phys. Lett. 37 10 (1980) 906
38. Ahmad R., Hassan M., Murtaza G., Akhter J.I., Qayyum A., Waheed A., and Zakaullah M. Radiat. Effects Defects Solids 161 2 (2006) 121
39. Hassan M., Rawat R.S., Lee P., Hassan S.M., Qayyum A., Ahmad R., Murtaza G., and Zakaullah M. Appl. Phys. A 90 (2008) 669
40. Tang H., Prasad K., Sanjines R., Schmid P.E., and Levy F. J. Appl. Phys. 75 4 (1994) 2042
41. Schuisky M., Harsta A., Aidla A., Kukli K., Kiisler A.A., and Aarik J. J. Electrochem. Soc. 147 (2000) 3319
42. Shannon R.D., and Pask J.A. J. Am. Ceram. Soc. 48 (1965) 391
43. Cullity B.D., and Stock S.R. Elements of X-ray Diffraction (1978), Addison-Wesley Publishing Company, Reading, MA
44. Spurr R.A., and Myers H. Anal. Chem. 29 (1957) 760
45. Barnes M.C., Kim D.Y., Ahn H.S., Lee C.O., and Hwang N.M. J. Cryst. Growth 213 (2000) 83
46. Jeon I.D., Park C.J., Kim D.Y., and Hwang N.M. J. Cryst. Growth 223 (2001) 6