Simultaneous real-time x-ray diffraction spectroscopy, Rutherford backscattering spectrometry, and sheet resistance measurements to study thin film growth kinetics by Kissinger plots

Journal of Applied Physics

Volumn 104, Issue 10, 2008, Pages

  Smeets, D ^a   Demeulemeester, J ^a   Deduytsche, D ^b   Detavernier, C ^b   Comrie, C M ^c   Theron, C C ^d   Lavoie, C ^e   Vantomme, A ^a  

^a KU LEUVEN   (Belgium)

^b GHENT UNIVERSITY   (Belgium)

^c UNIVERSITY OF CAPE TOWN   (South Africa)

^d MATERIALS RESEARCH GROUP   (South Africa)

^e IBM T J WATSON RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ANALYSIS; ACTIVATION ENERGY; ARRHENIUS PLOTS; BIOACTIVITY; CHEMICAL ACTIVATION; ELECTRIC RESISTANCE; ELECTRIC RESISTANCE MEASUREMENT; GROWTH (MATERIALS); GROWTH KINETICS; MOLECULAR BEAM EPITAXY; NUCLEATION; RUTHERFORD BACKSCATTERING SPECTROSCOPY; THICK FILMS; THIN FILM DEVICES; THIN FILMS;

KISSINGER ANALYSES; KISSINGER METHODS; KISSINGER PLOTS; NUCLEATION BARRIERS; NUCLEATION EFFECTS; RUTHERFORD BACKSCATTERING SPECTROMETRIES; SEMIQUANTITATIVE; SHEET RESISTANCE MEASUREMENTS; UNDESIRABLE EFFECTS; X-RAY DIFFRACTIONS;

FILM GROWTH;

EID: 57049180147     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3021110     Document Type: Article

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