A conductance model (approach) for kinetic studies: The Ti-Ta-Si system

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 18, Issue 6, 2000, Pages 2709-2714

  Pelleg, Joshua ^a   Rubinovich, L ^a  

^a BEN GURION UNIVERSITY OF THE NEGEV   (Israel)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; ANNEALING; ELECTRIC CONDUCTANCE; ELECTRIC RESISTANCE; PHASE TRANSITIONS; REACTION KINETICS; RELIABILITY; SILICON; TANTALUM COMPOUNDS; TITANIUM COMPOUNDS;

ISOTHERMAL ANNEALING;

THIN FILMS;

EID: 0034315761     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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