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Journal of Applied Physics

Volumn 79, Issue 8, 1996, Pages 4087-4095

Kinetics of suicide formation measured by in situ ramped resistance measurements

(2) Colgan, E G a D'Heurle, F M a,b,c

a IBM MICROELECTRONICS (United States)

b IBM RESEARCH (United States)

c ROYAL INSTITUTE OF TECHNOLOGY (Sweden)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0012932899 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.361771 Document Type: Article

Times cited : (48)

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