Mechanism of the etching rate change of aluminosilicate glass in HF acid with micro-indentation

Applied Surface Science

Volumn 255, Issue 5 PART 1, 2008, Pages 2290-2294

  Saito, Yasuhiro ^a   Okamoto, Shinya ^a   Inomata, Hiroyuki ^a   Kurachi, Junji ^a  

^a NIPPON SHEET GLASS CO LTD   (Japan)

Author keywords

Etching; Glass; Patterning; Surface

Indexed keywords

ALUMINOSILICATES; ETCHING; GLASS; LEACHING; SURFACES;

ALUMINOSILICATE GLASS; ETCHING RATE; GLASS SURFACES; HF ACID; LEACHING MECHANISM; LEACHING REACTION; MICRO INDENTATION; PATTERNING;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 56949097908     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2008.07.085     Document Type: Article

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