Maskless pattern fabrication on Pyrex 7740 glass surface by using nano-scratch with HF wet etching

Scripta Materialia

Volumn 52, Issue 2, 2005, Pages 117-122

  Youn, S W ^a   Kang, C G ^a  

^a Pusan National University   (South Korea)

Author keywords

Lithography; Nano scratch test; Silicate

Indexed keywords

ATOMIC FORCE MICROSCOPY; AUGER ELECTRON SPECTROSCOPY; CERAMIC MATERIALS; MACHINING; MORPHOLOGY; NANOTECHNOLOGY; PHOTOLITHOGRAPHY; PLASTIC DEFORMATION; RHEOLOGY; TRANSMISSION ELECTRON MICROSCOPY;

DUCTILE REGIME MACHINING; LAB-ON-A-CHIP (LOC); NANO-SCRATCH TEST; SYSTEM-ON-CHIP (SOC);

BOROSILICATE GLASS;

EID: 7444226978     PISSN: 13596462     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.scriptamat.2004.09.016     Document Type: Article

References (18)

1. Dragoman D, Dragoman M. Prog Quant Electron 2001;25:229.
2. Anderson H, van den Berg A. Sens Actuators B 2003;92:315.
3. Li K, Shapiro Y, Li JCM. Acta mater 1998;46(15):5569.
4. Shibata T, Fuji S, Makino E, Ikeda M. Jpan Prec Eng 1996;18(2/3):130.
5. Tan J, Syoji K, Suzuki H, Kuriyagawa T. Jpan Prec Eng 1998;64(9):1345.
6. Campell PM, Snow ES. Proc SPIE-Intl Soc Optical Engr 1999;3975:943.
7. Morita N. J of the JSGE 2001;45(6):275.
8. Ashida K, Morita N, Yoshida Y. JSME Int J, SerC 2001;44(1):51.
9. Miyake S, Kim JD. Jpn J Appl Phys 2002;41:L1116.
10. Miyake S, Kim JD. Jpn J Appl Phys 2001;40:L1247.
11. Youn SW, Kang CG. Scripta mater 2004;50:105.
12. Chang LC, Brewer GJ, Wheeler BC. Biomaterials 2003;24:2863.
13. Chou SY, Krauss PR, Renstrom P. J Appl Phys Lett 1995;67(21): 3114.
14. Chou SY, Krauss PR, Microelectronic Engineering 1997;35:237.
15. Gretillat MA, Paoletti F, Thiebaud P, Roth S, koudelka-Hap M, de Rooij NF. Sens Actuators A 1997;60:219.
16. Hulsenberg D. Microelectronics J 1997;28:419.
17. Fischer-Cripps Anthony C. Nanoindentation (Mech. Eng. Series). Berlin, Germany: Springer-Verlag; 2002. p. 71.
18. Lu CJ, Bogy DB. Int J Solids Structures 1995;32(12):1759.