Strategies in deep wet etching of Pyrex glass

Sensors and Actuators, A: Physical

Volumn 133, Issue 2 SPEC. ISS., 2007, Pages 395-400

  Iliescu, Ciprian ^a   Tay, Francis E H ^a,b   Miao, Jianmin ^c  

^a INSTITUTE OF BIOENGINEERING AND NANOTECHNOLOGY   (Singapore)

^b NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

^c NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

Author keywords

Masking layer; Residual stress; Wet etching of glass

Indexed keywords

ANNEALING; CONCENTRATION (PROCESS); DEGRADATION; ETCHING; HYDROPHILICITY; RESIDUAL STRESSES;

ETCHING SOLUTION; MASKING LAYERS; ULTRASONIC AGITATION; WET ETCHING OF GLASS;

GLASS;

EID: 33846516959     PISSN: 09244247     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.sna.2006.06.044     Document Type: Article

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