Wet etching study of silica glass after CW CO 2 laser treatment

Applied Surface Science

Volumn 225, Issue 1-4, 2004, Pages 250-255

  Zhao, Jian ^a   Sullivan, James ^a   Bennett, Ted D ^a  

^a University of California   (United States)

Author keywords

CO 2 laser; Fictive temperature; Silica glass; Wet etching

Indexed keywords

CARBON DIOXIDE; COMPUTERS; ETCHING; HYDROFLUORIC ACID; LASERS; MATHEMATICAL MODELS; MICROSTRUCTURE; SURFACE TENSION; THERMAL CYCLING; THERMODYNAMICS; VAPORIZATION; VISCOSITY;

CO2 LASERS; FICTIVE TEMPERATURE; WET ETCHING;

FUSED SILICA;

EID: 1342265797     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2003.10.012     Document Type: Article

References (13)

1. Tonshoff H.K., Overmeyer L., Ostendorf A., Wais J. Proc. SPIE. 2992:1997;150.
2. Davis D.D., Gaylord T.K., Glytsis E.N., Kosinski S.G., Mettler S.C., Vengsarkar A.M. Electron. Lett. 34:1998;302.
3. Liu L., Liu B., Yan X., Shao L., Li G., Yin Y., Li J., Guo Y. J. Opt. A: Pure Appl. Opt. 1(2):1999;220.
4. Triques A.L.C., Carvalho I.C.S., Moreira M.F., Carvalho H.R., Fischer R., Lesche B., Margulis W. Appl. Phys. Lett. 82:2003;2948.
5. Alley T.G., Brueck S.R.J. Opt. Lett. 23:1998;1170.
6. Lesche B., Garcia F.C., Hering E.N., Margulis W., Carvalho I.C.S., Laurell F. Phys. Rev. Lett. 78:1997;2172.
7. Bennett T.D., Krajnovich D.J., Li L. J. Appl. Phys. 85(1):1999;153.
8. Tool A.Q. J. Am. Ceram. Soc. 29:1946;240.
9. J. Zhao, J. Sullivan, J. Zayac, T.D. Bennett, in: Proceedings of the IMECE'2003, Washington, DC, November 2003.
10. Vollmayr K., Kob W., Binder K. Phys. Rev. B (Cond. Mat.). 54(22):1996;15808.
11. Michalske T.A., Bunker B.C. J. Appl. Phys. 56:1984;2686.
12. Bunker B.C., Haaland D.M., Michalske T.A., Smith W.L. Surf. Sci. 222:1989;95.
13. Michalske T.A., Bunker B.C. J. Am. Ceram. Soc. 76:1993;2613.