Influence of RF power and fluorine doping on the properties of sputtered ITO thin films

Applied Surface Science

Volumn 255, Issue 5 PART 1, 2008, Pages 1790-1795

  Nisha, M ^a   Jayaraj, M K ^a  

^a Department of Physics   (India)

Author keywords

Indium tin oxide; RF magnetron sputtering; Transparent conducting oxides

Indexed keywords

CONDUCTIVE FILMS; FLUORINE; INDIUM COMPOUNDS; MAGNETRON SPUTTERING; OPTICAL PROPERTIES; SEMICONDUCTOR DOPING; SUBSTRATES; TIN OXIDES; TRANSPARENT CONDUCTING OXIDES;

ARGON ATMOSPHERES; CRYSTALLINITIES; ELECTRICAL AND OPTICAL PROPERTIES; FLUORINE DOPING; GLASS SUBSTRATES; INDIUM TIN OXIDE; RF-MAGNETRON SPUTTERING; STRUCTURAL AND ELECTRICAL PROPERTIES;

THIN FILMS;

EID: 56949090298     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2008.06.019     Document Type: Article

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