Doped-fluorine on electrical and optical properties of tin oxide films grown by ozone-assisted thermal CVD

Journal of the Electrochemical Society

Volumn 154, Issue 1, 2007, Pages

  Bae, J W ^a   Lee, S W ^b   Yeom, G Y ^a  

^a Sungkyunkwan University   (South Korea)

^b Korea Electric Testing Institute   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

DOPING (ADDITIVES); FILM GROWTH; HYDROFLUORIC ACID; METALLORGANIC CHEMICAL VAPOR DEPOSITION; OPACITY; OZONE; TIN COMPOUNDS;

ADHERENCE STRENGTH; FLOW RATE; TETRAMETHYLTIN (TMT); TIN OXIDE FILM;

THIN FILMS;

EID: 33845266450     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.2382346     Document Type: Article

References (14)

1. J. L. Vossen, Phys. Thin Films, 9, 1 (1977).
2. G. Haacke, Annu. Rev. Mater. Sci., 7, 73 (1977).
3. R. E. Aitchison, Australian J. Appl. Sci., 5, 10 (1954).
4. J. A. Aboaf, V. C. Marcotte, and N. J. Chou, J. Electrochem. Soc., 120, 701 (1973).
5. R. Muto and S. Furuuchi, Rept. Res. Lab. Asahi Glass Co., 23, 27 (1973).
6. A. K. Saxena, R. Thangarjm, S. P. Singh, and O. P. Agnihotri, Thin Solid Films, 131, 121 (1985).
7. T. Maruyama and K. Tabata, J. Appl. Phys., 68, 4282 (1990).
8. G. Sanon, R. Rup, and A. Mansigh, Thin Solid Films, 190, 287 (1990).
9. K. H. Kim and C. G. Park, J. Electrochem. Soc., 138, 2408 (1991).
10. C. G. Borman and R. G. Gordon, J. Electrochem. Soc., 136, 3820 (1989).
11. Jim Vetrone and Yip-Wah Chung, J. Vac. Sci. Technol. A, 9, 3041 (1991).
12. K. L. Chopra, S. Major, and D. K. Pandya, Thin Solid Films, 102, 1 (1983).
13. R. G. Gordon, U. S. Pat. 4,146,657 (1979).
14. J. W. Bae, S. W. Lee, K. H. Song, J. I. Park, K. J. Park, Y. W. Ko, and G. Y. Yeom, Jpn. J. Appl. Phys., Part 1, 38, 2917 (1999).