In situ observation of friction-induced electrochemical reactions and impedance in tantalum ECMP

Journal of the Electrochemical Society

Volumn 156, Issue 1, 2009, Pages

  Gao, Feng ^a   Liang, Hong ^a  

^a Department of Electrical and Computer Engineering   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CORROSION; ELECTROCHEMICAL CORROSION; ELECTROCHEMICAL PROPERTIES; FRICTION; OPTIMIZATION; OXIDE FILMS; POLISHING; TANTALUM; TRANSITION METALS; TRIBOLOGY;

CORROSION CURRENTS; DOWN FORCES; ELECTROCHEMICAL IMPEDANCES; ELECTROCHEMICAL REACTIONS; IN-SITU; MECHANICAL PARAMETERS; MECHANICAL POLISHING; POLARIZATION RESISTANCES; POLISHING PARAMETERS; POTENTIODYNAMIC; PROCESS OPTIMIZATIONS; ROTATING SPEEDS; SURFACE ELECTROCHEMISTRIES; SURFACE OXIDE FILMS; TEST SYSTEMS; TRIBOLOGICAL PERFORMANCES;

ELECTROCHEMICAL IMPEDANCE SPECTROSCOPY;

EID: 56749131352     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.3021448     Document Type: Article

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