Chemical mechanical polishing of Ta

Electrochemical and Solid-State Letters

Volumn 3, Issue 2, 2000, Pages 95-98

  Hariharaputhiran, M ^a   Li, Y ^b   Ramarajan, S ^b   Babu, S V ^a  

^a CLARKSON UNIVERSITY   (United States)

^b Clarkson University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; ELECTRIC VARIABLES MEASUREMENT; ELECTROCHEMICAL ELECTRODES; ELECTROCHEMISTRY; SILICA; TANTALUM; WEAR OF MATERIALS;

CHEMICAL MECHANICAL POLISHING; FUMED SILICA PARTICLES; OPEN CIRCUIT POTENTIAL; OXIDANT; PASSIVE FILM;

CHEMICAL POLISHING;

EID: 0034140436     PISSN: 10990062     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1390969     Document Type: Article

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