Optical constants of magnetron-sputtered boron carbide thin films from photoabsorption data in the range 30 to 770eV

Applied Optics

Volumn 47, Issue 25, 2008, Pages 4633-4639

  Soufli, Regina ^a   Aquila, Andrew L ^b   Salmassi, Farhad ^b   Fernández Perea, Mónica ^c   Gullikson, Eric M ^b  

^a LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

^b LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^c INSTITUTO DE FÍSICA APLICADA   (Spain)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; BORON CARBIDE; CARBON; CARBON FILMS; MAGNETRON SPUTTERING; OPTICAL CONSTANTS; PHOTONS; REFRACTIVE INDEX; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SURFACE CHEMISTRY; THIN FILMS; X RAY ABSORPTION;

ABSORPTION EDGES; BORON CARBIDE FILMS; EXPERIMENTAL DETERMINATION; EXTREME ULTRAVIOLET; NEAR EDGE X-RAY ABSORPTION FINE STRUCTURES; PHOTOABSORPTIONS; PHOTON ENERGY RANGE; TRANSMITTANCE MEASUREMENTS;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 56249138430     PISSN: 1559128X     EISSN: 15394522     Source Type: Journal    
DOI: 10.1364/AO.47.004633     Document Type: Article

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