메뉴 건너뛰기




Volumn 5, Issue 6, 1996, Pages 748-750

Stress control of piezoelectric ZnO films on silicon substrates

Author keywords

[No Author keywords available]

Indexed keywords

ACOUSTIC WAVES; CMOS INTEGRATED CIRCUITS; DEPOSITION; FILM GROWTH; INTEGRATED CIRCUIT MANUFACTURE; PIEZOELECTRIC MATERIALS; SEMICONDUCTING SILICON; SILICON WAFERS; STRESSES; SUBSTRATES; ZINC OXIDE;

EID: 0030378559     PISSN: 09641726     EISSN: None     Source Type: Journal    
DOI: 10.1088/0964-1726/5/6/003     Document Type: Article
Times cited : (38)

References (28)
  • 1
    • 0026837397 scopus 로고
    • Sensor technology strategy in silicon
    • Sarro P M 1992 Sensor technology strategy in silicon Sensors Actuators A 31 138-43
    • (1992) Sensors Actuators A , vol.31 , pp. 138-143
    • Sarro, P.M.1
  • 2
    • 0028495382 scopus 로고
    • Integrated-circuit-compatible design and technology of acoustic-wave-based microsensors
    • Vellekoop M J, Lubking G W, Sarro P M and Venema A 1994 Integrated-circuit-compatible design and technology of acoustic-wave-based microsensors Sensors Actuators A 44 249-63
    • (1994) Sensors Actuators A , vol.44 , pp. 249-263
    • Vellekoop, M.J.1    Lubking, G.W.2    Sarro, P.M.3    Venema, A.4
  • 3
    • 0003742911 scopus 로고
    • High deposition rate sputtered ZnO thin films for BAW and SAW applications
    • Defranould Ph 1981 High deposition rate sputtered ZnO thin films for BAW and SAW applications Proc. IEEE Ultrason. Symp. pp 483-8
    • (1981) Proc. IEEE Ultrason. Symp. , pp. 483-488
    • Defranould, Ph.1
  • 4
    • 0015602577 scopus 로고
    • dc triode sputtered zinc oxide surface elastic wave transducers
    • Hickernell F S 1973 dc triode sputtered zinc oxide surface elastic wave transducers J. Appl. Phys. 44 1061-71
    • (1973) J. Appl. Phys. , vol.44 , pp. 1061-1071
    • Hickernell, F.S.1
  • 5
    • 0016526092 scopus 로고
    • Microstructure of ZnO films used for acoustic surface-wave generation
    • Hickernell F S 1975 Microstructure of ZnO films used for acoustic surface-wave generation J. Vac. Sci. Technol. 12 879-83
    • (1975) J. Vac. Sci. Technol. , vol.12 , pp. 879-883
    • Hickernell, F.S.1
  • 6
    • 0020305447 scopus 로고
    • Surface acoustic wave propagation loss in zinc oxide films
    • Hickernell F S 1982 Surface acoustic wave propagation loss in zinc oxide films Proc. IEEE Ultrason. Symp. pp 325-8
    • (1982) Proc. IEEE Ultrason. Symp. , pp. 325-328
    • Hickernell, F.S.1
  • 7
    • 0019024175 scopus 로고
    • Characterization of ZnO piezoelectric films prepared by rf planar-magnetron sputtering
    • Yamamoto T, Shiosaki T and Kawabata A 1980 Characterization of ZnO piezoelectric films prepared by rf planar-magnetron sputtering J. Appl. Phys. 51 3113-20
    • (1980) J. Appl. Phys. , vol.51 , pp. 3113-3120
    • Yamamoto, T.1    Shiosaki, T.2    Kawabata, A.3
  • 8
    • 0016544571 scopus 로고
    • Studies of the optimum conditions for growth of rf-sputtered ZnO films
    • Khuri-Yakub B T, Kino G S, Galle P 1975 Studies of the optimum conditions for growth of rf-sputtered ZnO films J. Appl. Phys. 46 3266-72
    • (1975) J. Appl. Phys. , vol.46 , pp. 3266-3272
    • Khuri-Yakub, B.T.1    Kino, G.S.2    Galle, P.3
  • 9
    • 0020476161 scopus 로고
    • Characterization of rf-sputtered ZnO thin films by x-ray diffraction and scanning electron microscopy
    • Sen S, Leary D J, Bauer C L 1982 Characterization of rf-sputtered ZnO thin films by x-ray diffraction and scanning electron microscopy Thin Solid Films 94 7-14
    • (1982) Thin Solid Films , vol.94 , pp. 7-14
    • Sen, S.1    Leary, D.J.2    Bauer, C.L.3
  • 11
    • 0004862785 scopus 로고
    • C-axis orientation of sputtered ZnO films
    • Dybwad G L 1971 C-axis orientation of sputtered ZnO films J. Appl. Phys. 42 5192-4
    • (1971) J. Appl. Phys. , vol.42 , pp. 5192-5194
    • Dybwad, G.L.1
  • 12
    • 0018810045 scopus 로고
    • Characterization of rf sputtered ZnO and ZnS thin films for SAW transducers by x-ray diffraction analysis
    • Schoenwald J S, Keester K L and Staples E J 1979 Characterization of rf sputtered ZnO and ZnS thin films for SAW transducers by x-ray diffraction analysis Proc. IEEE Ultrason. Symp. pp 926-31
    • (1979) Proc. IEEE Ultrason. Symp. , pp. 926-931
    • Schoenwald, J.S.1    Keester, K.L.2    Staples, E.J.3
  • 18
    • 0014612979 scopus 로고
    • Study of the structure and properties of thick vacuum condensates of nickel, titanium, tungsten, aluminum oxide and zirconium dioxide
    • Movchan B A and Demchishin A V 1969 Study of the structure and properties of thick vacuum condensates of nickel, titanium, tungsten, aluminum oxide and zirconium dioxide Phys. Met. Metallogr. 28 83-90
    • (1969) Phys. Met. Metallogr. , vol.28 , pp. 83-90
    • Movchan, B.A.1    Demchishin, A.V.2
  • 19
    • 0016083153 scopus 로고
    • Influence of apparatus geometry and deposition conditions on the structure and topography of thick sputtered coatings
    • Thornton J A 1974 Influence of apparatus geometry and deposition conditions on the structure and topography of thick sputtered coatings J. Vac. Sci. Technol. 11 666-70
    • (1974) J. Vac. Sci. Technol. , vol.11 , pp. 666-670
    • Thornton, J.A.1
  • 21
    • 0021517474 scopus 로고
    • Measurements of adherence of residually stressed thin films by indentation. II. Experiments with ZnO/Si
    • Rossington C, Evans A G, Marshall D B and Khuri-Yakub B T 1984 Measurements of adherence of residually stressed thin films by indentation. II. Experiments with ZnO/Si J. Appl. Phys. 56 2639-44
    • (1984) J. Appl. Phys. , vol.56 , pp. 2639-2644
    • Rossington, C.1    Evans, A.G.2    Marshall, D.B.3    Khuri-Yakub, B.T.4
  • 23
    • 0038509466 scopus 로고
    • Phenomenological description of the response and detecting ability of radiation detectors
    • Jones R C 1959 Phenomenological description of the response and detecting ability of radiation detectors Proc. IRE 47 1495-502
    • (1959) Proc. IRE , vol.47 , pp. 1495-1502
    • Jones, R.C.1
  • 24
    • 0017784022 scopus 로고
    • The effect of the structure and composition of zinc oxide films on their elastic properties
    • Hickernell F J 1977 The effect of the structure and composition of zinc oxide films on their elastic properties Proc. IEEE Ultrason. Symp. pp 309-12
    • (1977) Proc. IEEE Ultrason. Symp. , pp. 309-312
    • Hickernell, F.J.1
  • 25
    • 0019033186 scopus 로고
    • Postdeposition annealing behavior of rf sputtered ZnO films
    • Lad R J, Funkenbusch P D and Aita C R 1980 Postdeposition annealing behavior of rf sputtered ZnO films J. Vac. Sci. Technol. 17 808-11
    • (1980) J. Vac. Sci. Technol. , vol.17 , pp. 808-811
    • Lad, R.J.1    Funkenbusch, P.D.2    Aita, C.R.3
  • 26
    • 0242327638 scopus 로고
    • Post-deposition annealing of zinc oxide films
    • Hickernell F S 1981 Post-deposition annealing of zinc oxide films Proc. IEEE Ultrason. Symp. pp 489-92
    • (1981) Proc. IEEE Ultrason. Symp. , pp. 489-492
    • Hickernell, F.S.1
  • 27
    • 0020113848 scopus 로고
    • Stress relief of basal orientation zinc oxide films by isothermal annealing
    • Gawlak C J and Aita C R 1983 Stress relief of basal orientation zinc oxide films by isothermal annealing J. Vac. Sci. Technol. A 1 415-8
    • (1983) J. Vac. Sci. Technol. A , vol.1 , pp. 415-418
    • Gawlak, C.J.1    Aita, C.R.2
  • 28
    • 0027905783 scopus 로고
    • Post-deposition annealing of RF-sputtered zinc-oxide films
    • Bekman H H P Th, Benoist K W and Joppe J L 1993 Post-deposition annealing of RF-sputtered zinc-oxide films Appl. Surf. Sci. 70/71 347-50
    • (1993) Appl. Surf. Sci. , vol.70-71 , pp. 347-350
    • Bekman, H.H.P.Th.1    Benoist, K.W.2    Joppe, J.L.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.