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Surface and Coatings Technology

Volumn 203, Issue 5-7, 2008, Pages 745-749

Mechanical properties of a-C:H/Si-containing a-C:H multilayered coatings grown by LF-PECVD

(5) Chouquet, C a,b Ducros, C b Barrat, S a Billard, A c Sanchette, F b

a INSTITUT JEAN LAMOUR (France)

b CEA GRENOBLE (France)

c UNIVERSITÉ DE TECHNOLOGIE DE BELFORT MONTBÉLIARD (France)

Author keywords

a C:H Si containing a C:H multilayered films; Friction; Hardness; LF PECVD; Residual stress; Young modulus

Indexed keywords

AMORPHOUS CARBON; AMORPHOUS SILICON; CARBON FILMS; ENERGY ABSORPTION; FRICTION; GAS MIXTURES; HARDNESS; MECHANICAL PROPERTIES; MICROSCOPIC EXAMINATION; MODULATION; PLASMA DEPOSITION; PLASMA DIAGNOSTICS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMAS; RESIDUAL STRESSES; SILICON; STRENGTH OF MATERIALS; STRESSES; TRIBOLOGY; WEAR RESISTANCE;

A-C:H/SI-CONTAINING A-C:H MULTILAYERED FILMS; AMORPHOUS HYDROGENATED CARBONS; C:H FILMS; CHEMICAL VAPOUR DEPOSITIONS; COMPRESSIVE RESIDUAL STRESSES; DO-MAINS; FRICTION COEFFICIENTS; LF-PECVD; LOW FREQUENCIES; MECHANICAL BEHAVIOURS; MULTILAYERED COATINGS; MULTILAYERED FILMS; PLASMA POWERS; PRECURSOR GASSES; SINGLE LAYERS; TETRAMETHYL SILANES; TRIBOLOGICAL PROPERTIES; TRIBOMETER; WEAR RATES; WIDER RANGES; WORKING PRESSURES; YOUNG MODULUS;

AMORPHOUS FILMS;

EID: 55749092120 PISSN: 02578972 EISSN: None Source Type: Journal
DOI: 10.1016/j.surfcoat.2008.08.008 Document Type: Article

Times cited : (24)

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