Tribological properties of a-C:H multilayer structures

Thin Solid Films

Volumn 338, Issue 1-2, 1999, Pages 172-176

  Knoblauch Meyer, L ^a   Hauert, R ^a  

^a SWISS FEDERAL LABORATORIES FOR MATERIALS SCIENCE AND TECHNOLOGY   (Switzerland)

Author keywords

a C:H; Multilayers; Plasma processing and deposition; Tribology

Indexed keywords

CARBON; CHEMICAL VAPOR DEPOSITION; MULTILAYERS; NANOSTRUCTURED MATERIALS; PLASMA APPLICATIONS; TRIBOLOGY;

PLASMA ACTIVATED CHEMICAL VAPOR DEPOSITION (PACVD);

AMORPHOUS FILMS;

EID: 0032757506     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(98)01150-X     Document Type: Article

References (3)

1. J. Robertson, Prog. Solid State Chem. 21 (1991) 199.
2. L. Knoblauch, R. Hauert, A. Savan, E. Pfluger, S. Tixier, M. Simmonds, H.v. Swygenhoven, S. Mikhailov, Surf. Coating Technol. 94-95 (1997) 521.
3. S. Anders, D.L. Callahan, G.M. Pharr, T.Y. Tsui, C.S. Bhatia, Surf. Coating Technol. 94-95 (1997) 189.