New process for the development of hard and stable sputtered amorphous carbon films

Vacuum

Volumn 53, Issue 1-2, 1999, Pages 61-65

  Logothetidis, S ^a   Gioti, M ^a   Charitidis, C ^a   Patsalas, P ^a  

^a ARISTOTLE UNIVERSITY OF THESSALONIKI   (Greece)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON; CHEMICAL BONDS; DENSITY (SPECIFIC GRAVITY); ELASTICITY; ELECTRIC POTENTIAL; ELECTROMAGNETIC WAVE REFLECTION; ELLIPSOMETRY; FILM GROWTH; MAGNETRON SPUTTERING; MULTILAYERS; STRESS RELAXATION; STRESSES;

AMORPHOUS CARBON FILMS; INTERNAL STRESS; NANOINDENTATION MEASUREMENTS; X RAY REFLECTIVITY;

AMORPHOUS FILMS;

EID: 0033131842     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0042-207X(98)00392-3     Document Type: Article

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