Thermodynamic analysis of growth of iron oxide films by MOCVD using tris(t-butyl-3-oxo-butanoato)iron(III) as precursor

Bulletin of Materials Science

Volumn 31, Issue 5, 2008, Pages 723-728

  Dhar, Sukanya ^a   Shalini, K ^a   Shivashankar, S A ^a  

^a INDIAN INSTITUTE OF SCIENCE   (India)

Author keywords

CVD phase stability diagrams; MOCVD; Pure and mixed iron oxide films

Indexed keywords

DEPOSITION; IRON ANALYSIS; IRON COMPOUNDS; IRON OXIDES; MOLECULAR OXYGEN; OXIDE FILMS; OXYGEN; PHASE STABILITY; SYSTEM STABILITY; THERMOANALYSIS; THERMODYNAMIC STABILITY; THERMODYNAMICS;

CARBONACEOUS IMPURITIES; CHEMICAL VAPOUR DEPOSITIONS; CVD PHASE STABILITY DIAGRAMS; DEPOSITION OF FILMS; METAL ORGANIC; MIXED PHASIS; MOCVD; PHASE STABILITY DIAGRAMS; PURE AND MIXED IRON OXIDE FILMS; SEM ANALYSES; THERMODYNAMIC ANALYSIS;

CHEMICAL VAPOR DEPOSITION;

EID: 55649123531     PISSN: 02504707     EISSN: None     Source Type: Journal    
DOI: 10.1007/s12034-008-0114-1     Document Type: Article

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